Gas Purification System and Digital Control for Lab usage
Application:
- Anhydrous, anaerobic and clean, ultra-clean work environment
- The R&D and production of batteries and battery materials (lithium-ion battery, battery, solar cell, the lithium iron phosphate, etc.)
- The R&D and manufacturing of special lamps: HID lamps, metal halide, ceramic metal halide.
- Welding: resistance welding, TIG welding, laser welding, plasma welding, brazing.
- OLED R&D and production.
- The development and production of medical supplies.
- Development and production of the super capacitor.
- Fine chemicals, nuclear industry.
- The new energy and new materials development and production
HOW GAS PURIFICATION SYSTEM WORK
Gas purification system used as circulation to remove internal active substances, allowing the system always maintain high cleanliness and high purity inert gas environment (water, oxygen are equipment a 1 ppm below according to ISO 10648-2 ).
Mainly for O2, H2O clearing.
Technical Specification:
Item 1: Gas purification system
| Configuration and Quantity | Technical parameters | Remark |
| 1 Gas purification system | Single purification column (GPS-1) | ◎ Copper Catalyst capable of receiving at least 60L oxygen and molecular sieve capable of holding at least 2000g of moisture; ◎ German BASF copper catalyst materials, USA UOP efficient absorbent molecular sieve materials, ◎ The purification system of regeneration process automatically control.(Include 1 heater) ◎ Long-term, continuing to maintain gas purity: H2O < 1ppm, O2 < 1ppm. |
| 1 Foot controller | Waterproof Double pedal | Control purification system to increase the pressure and decrease the pressure in the cabinet. |
| Purge valve | Electro-pneumatic valve | Automatic electro-pneumatic valve Brand: BURKERT |
| 1 Circulating Blower | High-speed frequency blower | ◎ Stainless Steel encapsulated blower . ◎ High degree of vacuum of the circulation pump with various speed; ◎ Flow rate: 100m3/h(58 cfm) at △P=60mbar(60Hz) |
| 2 Pipe line | Stainless steel SS304 | Stainless pipe lines, Closed Loop Gas Recirculation System with KF40 |
| 1 Cooling System | Include 1 heat exchanger | Used for high temperature operation of users in the main chamber, which cause temperature >45°C |
| Pressure Control unit | +15 mbar to -15mbar (relative pressure) | Box pressure with Automatic control; Manual pressure control is allowed with foot pedal switch (from +15 mbar to -15 mbar) Pressure Sensor: USA SETRA |
| Display unit | PLC controller 7” Color Touch Screen Monitor | Auto Display of moisture and oxygen level during working conditions Brand: SIEMENS. |
| Moisture & Oxygen control system | New Upgraded Color touch screen: 7 inch | PLC control system, touch-screen operation, Brand: SIEMENS; * Moisture concentration: 0～1000ppm, with an accuracy of 0.1ppm. * Oxygen concentration: 0～1000ppm, with an accuracy of 0.1ppm. * Automatic system data logging. |
Item 2: Accessories
| Configuration and Quantity | Technical parameters | Remark |
| 1O2 Analyzer | 0～1000ppm, with an accuracy of 0.1ppm | Touch-screen display; Oxygen sensor could detect less than 1ppm. Brand: USA AII |
| 1 H2O Analyzer | 0～1000ppm, with an accuracy of 0.1ppm | Touch-screen display; Moisture sensor could detect less than 1ppm. Brand: UK MICHELL |
| Molecular sieve | 15kgs | USA UOP brand; For spare use. |
| Copper catalyst | 15kgs | Germany BASF R3-11 brand; For spare use |
| 1 Rotary Vane Pump | 4L/S pump speed | Vacuum pump with Oil Mist Filter Brand: Japan ULVAC |
Performance Specification:
Item 1.Control System Functional Description
- Automatic pressure control to maintain set pressure limits
- Automatic regeneration control
- Automatic box purging
- Automatic Circulation control
- Foot pedal operated operator pressure control
- System control parameter settings;
- Data Log for Pressure / O2 /H2O Measurement
- End User Login: User /Admin
Item 2: Working conditions and performance indicators
| Working Voltage | 220 VAC, 50 Hz, single phase |
| Max. Power | ≈2.0KW |
| Working Gas | Operating gas: Inert gas such as N2, Ar, He |
| Regenerating gas:For regenerating both oxygen and H2O remover, use mixture of H2 (5-10%) and operating gas |
| Water concentration | <1 ppm (20 °C, 1 atm) |
| Oxygen concentration | <1 ppm (20 °C, 1 atm) |
| The ultra low leak rate technology | <0.001 vol% / hr (depending on oxygen concentration inside the glove box) |
Power Supply:220V(AC) 50HZ Max. Power:2000W
Remarks:Price include Purification system &Water probe &Oxygen probe &Vacuum Pump
Standard Accessories: Brand
PLC & Touch Screen: Germany SIEMENS
Water Probe: American AII
Oxygen Probe: British MICHELL
Vacuum Pump: Japan ULAVC
Standard Accessories | Brand |
| PLC | SIEMENS (Germany) |
| Touch screen | SIEMENS (Germany) |
| Purification material | BASF (Germany) UOP (USA) |
| Pressure sensor | SETRA (USA) |
| Magnetic Valve | BURKERT (Germany) |
| Moisture Sensor | MICHELL (UK) |
| Oxygen Sensor | AII ( USA) |
| Vacuuum Pump | ULVAC (Japan) |
Product Tags:
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Digital Control SS304 Gas Purification System for Lab usage Images
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